Dec. 08, 2004
Inabata & Co., Ltd. Takes Part in Semicon Japan 2004
Inabata & Co., Ltd. participated in Semicon Japan 2004, held December 1 - 3 at Makuhari Messe in Chiba Prefecture. Semicon Japan is one of the world's biggest exhibit for semiconductor equipment and materials. Introduced at the booth featuring products manufactured in the first half of the manufacturing process were new uses for thin film characteristic measurement equipment made by n&k Technology, Inc. (http://www.nandk.com), and state-of-the-art photo-mask pellicles from Micro Lithography, Inc. (http//www.mliusa.com) - both of which companies are based in the United States. Seminars, held by n&k for semiconductor device manufacturers at conference rooms on site.
Displayed for the first time this year were ion exchange resin from Purolite International Co., Ltd. (http://www.purolite.co.jp) and a high-concentration ozone generator from Rokitechno Co., Ltd. (http://www.rokitechno.co.jp).
Introduced at the booth featuring products manufactured in the second half of the manufacturing process were the new SX3100 handler with widely improved throughput from Shinano Electronics Co., Ltd. (http://www.synax.co.jp) -an affiliate Inabata & Co., Ltd., a lead free solder flux washing system from KakenTech Co., Ltd. (http://www.kaken-tech.co.jp), and an infrared microscope from Disc Inspection Technology Co., Ltd. (http://www.disctech.co.jp).